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200 mm DLI-MOCVD / DLI-ALD machine

The Annealsys MC200 system is a CVD reactor especially developed to meet the requirements of research and development units. It is designed for MOCVD and ALD processes for deposition of metal and metal alloys, oxides and transition metal nitrides.It allows doing heteroepitaxy of oxides on single crystals wafers (such as [...]

 

Joint laboratory Annealsys and INL for CVD/ALD process development.

Montpellier, France, September 19, 2013.Annealsys is pleased to announce the creation of a common laboratory (InCVD) with Institut des Nanotechnologies de Lyon (INL – UMR CNRS 5270) supported by the French National Research Agency (ANR: Agence Nationale de la Recherche).The InCVD laboratory is dedicated to innovating chemical vapor deposition processes [...]

 

Graphene growth in AS-One RTP system

Annealsys is partner of Metrograph, ANR funded program, for the development of graphene based quantum resistance challenging the usual GaAs-based technique and the realization of universality tests of the Quantum Hall Effect.This is a 3-year project with Laboratoire Charles Coulomb (LC2), Commissariat à l’Energie Atomique (CEA) Laboratoire National d’Essais (LNE), [...]

 

University of Burgundy France orders Annealsys DLI-MOCVD system MC050

Montpellier, France, February 1, 2012.Annealsys announced today the shipment of its 2-inch DLI-MOCVD system to University of Burgundy in Dijon, France.The Annealsys MC050 is a 2-inch DLI-MOCVD / RTP reactor especially developed to meet the requirements of research and development units. The MC050 allows doing deposition of oxides, nitrides, metals, [...]

 

MC050: 2-inch mutli process reactor MOCVD, ALD, RTP & RTCVD

The Annealsys MC050 is a 2-inch CVD reactor with multi process capabilities including DLI-MOCVD, DLI-ALD, RTP and RTCVD. It has been especially developed to meet the requirements of research and development units and allows running several processes in sequence inside the same process chmaber.The DLI (direct liquid injection) vaporizer offers [...]

 

Spray CVD system: 2-inch aerosol CVD system

The Annealsys Spray-CVD-050 is a 2-inch Spray CVD (aerosol CVD) reactor especially developed to meet the requirements of research and development units. The infrared lamp heating system provides in-situ rapid thermal annealing process capability inside the deposition chamber. The system can be equipped with Kemstream Atokit for the precursor atomization [...]

 

ELOGE 3D poster to be presented at IMLB 2010 (CVD of electrolyte)

A poster on the results of the work performed in the frame of the ANR project ELOGE 3D (Chemical …

 

Annealsys announces Fast cooling solutions for RTP systems

Annealsys is proud to announce fast cooling solutions for Rapid Thermal Processing systems. These …

 

Annealsys announces the AS-Micro Twin Chamber system

The AS-Micro Twin allows management of cross-contaminations control . Incompatible materials can be …

 

Annealsys presents its new catalog of CVD, MOCVD and Spray CVD systems

These reactors were specially developed for R&D applications. They allow doing heteroepitaxy of …

 

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