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Joint laboratory Annealsys and INL for CVD/ALD process development.

Montpellier, France, September 19, 2013.Annealsys is pleased to announce the creation of a common laboratory (InCVD) with Institut des Nanotechnologies de Lyon (INL – UMR CNRS 5270) supported by the French National Research Agency (ANR: Agence Nationale de la Recherche).The InCVD laboratory is dedicated to innovating chemical vapor deposition processes [...]

 

Graphene growth in AS-One RTP system

Annealsys is partner of Metrograph, ANR funded program, for the development of graphene based quantum resistance challenging the usual GaAs-based technique and the realization of universality tests of the Quantum Hall Effect.This is a 3-year project with Laboratoire Charles Coulomb (LC2), Commissariat à l’Energie Atomique (CEA) Laboratoire National d’Essais (LNE), [...]

 

University of Burgundy France orders Annealsys DLI-MOCVD system MC050

Montpellier, France, February 1, 2012.Annealsys announced today the shipment of its 2-inch DLI-MOCVD system to University of Burgundy in Dijon, France.The Annealsys MC050 is a 2-inch DLI-MOCVD / RTP reactor especially developed to meet the requirements of research and development units. The MC050 allows doing deposition of oxides, nitrides, metals, [...]

 

ELOGE 3D poster to be presented at IMLB 2010 (CVD of electrolyte)

A poster on the results of the work performed in the frame of the ANR project ELOGE 3D (Chemical …

 

Annealsys announces Fast cooling solutions for RTP systems

Annealsys is proud to announce fast cooling solutions for Rapid Thermal Processing systems. These …

 

Annealsys announces the AS-Micro Twin Chamber system

The AS-Micro Twin allows management of cross-contaminations control . Incompatible materials can be …

 

Annealsys presents its new catalog of CVD, MOCVD and Spray CVD systems

These reactors were specially developed for R&D applications. They allow doing heteroepitaxy of …

 

Annealsys represents Cambridge NanoTech in France .

Cambridge NanoTech ALD systems: – Savannah ALD systems – Phoenix Production ALD system – Fiji …

 

Annealsys partner of Crisilal, ANR funded program, for crystallization of silicon thin films on metal substrates for photovoltaic applications

Annealsys is partner of Crisilal R&D project with CEA LITEN-INES-RDI, Université Louis Pasteur …

 

Annealsys introduces MC050 Spray CVD and MOCVD R&D tool with in-situ annealing capability

Annealsys introduces MC050 2-inch MOCVD and Spray CVD reactor especially developed to meet the …

 
 

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