The Annealsys Spray-CVD-050 is a 2-inch Spray CVD (aerosol CVD) reactor especially developed to meet the requirements of research and development units.
The infrared lamp heating system provides in-situ rapid thermal annealing process capability inside the deposition chamber.
The system can be equipped with Kemstream Atokit for the precursor atomization and spray generation.
The system has vacuum capability and gas mixing capability.
The Spray CVD tool is fully computer controlled for easy utilization and data logging. The software is Windows compatible.