Montpellier, France, February 1, 2012.
Annealsys announced today the shipment of its 2-inch DLI-MOCVD system to University of Burgundy in Dijon, France.
The Annealsys MC050 is a 2-inch DLI-MOCVD / RTP reactor especially developed to meet the requirements of research and development units. The MC050 allows doing deposition of oxides, nitrides, metals, III-V and II-VI on various types of substrates by MOCVD using diluted solid and liquid organometallic precursors. Glove box loading version is available as an option. The MC050 system can be provided with one or several direct liquid injection (DLI) vaporizers allowing the widest range of utilization of precursors for development of new materials. The infrared lamp heating system provides in-situ annealing process capability inside the deposition chamber.
The MC050 was purchased by the team “Surfaces et Interfaces d’Oxydes Métalliques” of Laboratoire Interdisciplinaire Carnot de Bourgogne (ICB) of the University of Burgundy. It has been funded by Conseil Régional de Bourgogne and FEDER.
The scientific aim of the team is to understand the mechanisms involved at the surface and interfaces of materials (eg metal oxides) interacting with a gas or solid: reactivity of single-crystal surfaces or nanoparticles, deposition of a few monolayers to several hundred nanometers of metals, oxides, nitrides, carbonitrides or oxynitrides
Fields of applications:
• Environment (gas sensors, anti-pollution, agents, …)
• Chemical industry (catalysts, catalysts supports)
• Microelectronics (high-performance dielectrics)
• Energy (transparent conductive oxides, solar cells, …)
• Mechanical tooling (coatings for the improvement of cutting tools, especially for wood industry)
Professor Luc Imhoff is currently the principle investigator of this project. He has many years of experience in thin film technology and material research.
Contact: Franck Laporte
Web site: www.annealsys.com